1. Scope

1.1 This test method covers the determination of dissolved organic and inorganic matter and colloidal material found in high-purity water used in the semiconductor, aerospace, and other industries. This material is referred to as residue after evaporation (RAE). The range of the test method is from 0.1 g/L(ppb) to 20 mg/L (ppm).

1.2 This test method uses a continuous, real time monitoring technique to measure the concentration of RAE. A pressurized sample of high-purity water is supplied to the test method's apparatus continuously through ultra-clean fittings and tubing. Contaminants from the atmosphere are therefore prevented from entering the sample. General information on the test method and a literature review on the continuous measurement of RAE has been published.

1.3 The values stated in SI units are to be regarded as the standard. The values given in parentheses are for information only.

1.4 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use. For specific hazards statements, see Section 8.

2. Referenced Documents (purchase separately) The documents listed below are referenced within the subject standard but are not provided as part of the standard.

ASTM Standards

D1129 Terminology Relating to Water

D2777 Practice for Determination of Precision and Bias of Applicable Test Methods of Committee D19 on Water

D3370 Practices for Sampling Water from Closed Conduits

D3864 Guide for Continual On-Line Monitoring Systems for Water Analysis

D3919 Practice for Measuring Trace Elements in Water by Graphite Furnace Atomic Absorption Spectrophotometry

D5127 Guide for Ultra-Pure Water Used in the Electronics and Semiconductor Industries

E1184 Practice for Determination of Elements by Graphite Furnace Atomic Absorption Spectrometry

Keywords

high-purity water; nonvolatile residue; residue after evaporation; Colloidal dispersions; Contamination--water; Dissolved elements (of water); High-purity water; Inorganic compounds--water; Nonvolatile residue (NVR); Organic compounds--water; Residue; Residue after evaporation (RAE); Semiconductors--water applications;

ICS Code

ICS Number Code 71.040.40 (Chemical analysis)

DOI: 10.1520/D5544-05

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